Influence of annealing temperature on the properties of transparent conductive and near-infrared reflective ZnO:Ga films

Scripta Materialia

Volumn 58, Issue 1, 2008, Pages 21-24

  Ma, Quan Bao ^a   Ye, Zhi Zhen ^a   He, Hai Ping ^a   Zhu, Li Ping ^a   Huang, Jing Yun ^a   Zhang, Yin Zhu ^a   Zhao, Bing Hui ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

Annealing; Electrical resistivity; Optical spectroscopy; Semiconductor compounds; ZnO:Ga thin films

Indexed keywords

ANNEALING; EMISSION SPECTROSCOPY; GALLIUM ALLOYS; INFRARED RADIATION; MAGNETRON SPUTTERING; REFLECTION; SEMICONDUCTOR COUNTERS; THERMAL EFFECTS;

ANNEALING TEMPERATURE; ELECTRICAL RESISTIVITY; SEMICONDUCTOR COMPOUNDS;

ZINC OXIDE;

EID: 35348881513     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2007.09.009     Document Type: Article

References (26)

1. Agashe C., Kluth O., Hüpkes J., Zastrow U., and Rech B. J. Appl. Phys. 101 (2007) 083705
2. Ma Q.B., Ye Z.Z., He H.P., Zhu L.P., Wang J.R., and Zhao B.H. Mater. Lett. 61 (2007) 2460
3. Ye Z.Z., and Tang J.F. Appl. Opt. 28 (1989) 2817
4. Henley S.J., Ashfold M.N.R., and Cherns D. Surf. Coat. Technol. 177 (2004) 271
5. Assuncão V., Fortunato E., Marques A., Águas H., Ferreira I., Costa M.E.V., and Martins R. Thin Solid Films 427 (2003) 401
6. Ma Q.B., Ye Z.Z., He H.P., Wang J.R., Zhu L.P., and Zhao B.H. Vacuum 82 (2008) 9
7. Reddy K.T.R., Reddy T.B.S., Forbes I., and Miles R.W. Surf. Coat. Technol. 151-152 (2002) 110
8. Kaul A.R., Gorbenko O.Y., Botev A.N., and Burova L.I. Superlatt. Microstruct. 38 (2005) 272
9. Park S.M., Ikegami T., and Ebihara K. Thin Solid Films 513 (2006) 90
10. Minami T., Ida S., Miyata T., and Minamino Y. Thin Solid Films 445 (2003) 268
11. Cheong K.Y., Muti N., and Ramanan S.R. Thin Solid Films 410 (2002) 142
12. Iwata K., Sakemi T., Yamada A., Fons P., Awai K., Yamamoto T., Matsubara M., Tampo H., and Niki S. Thin Solid Films 445 (2003) 274
13. Lee B.T., Kim T.H., and Jeong S.H. J. Phys. D: Appl. Phys. 39 (2006) 957
14. Gomez H., Maldonado A., Olvera M.L., and Acosta D.R. Sol. Energy Mater. Sol. Cells 87 (2005) 107
15. Szyszka B. Thin Solid Films 351 (1999) 64
16. G.Z. Xing, B. Yao, C.X. Cong, T. Yang, Y.P. Xie, B.H. Li, D.Z. Shen, J. Alloy Compd., in press.
17. Wang W.W., Diao X.G., Wang Z., Yang M., Wang T.M., and Wu Z. Thin Solid Films 491 (2005) 54
18. Song D., Aberle A.G., and Xia J. Appl. Surf. Sci. 195 (2002) 291
19. Tsuji T., and Hirohashi M. Appl. Surf. Sci. 157 (2000) 47
20. Schuler T., and Aegerter M.A. Thin Solid Films 351 (1999) 125
21. Drude P. Z. Phys. D1 (1968) 1667
22. Jin Z.C., Hamberg I., and Granqvist C.G. J. Appl. Phys. 64 (1988) 5117
23. Burstein E. Phys. Rev. 93 (1954) 632
24. Moss T.S. Proc. Phys. Soc. London Ser. B 67 (1954) 775
25. Lee H.W., Lau S.P., Wang Y.G., Tse K.Y., Hng H.H., and Tay B.K. J. Cryst. Growth 268 (2004) 596
26. Ma Q.B., Ye Z.Z., He H.P., Hu S.S., Wang J.R., Zhu L.P., Zhang Y.Z., and Zhao B.H. J. Cryst. Growth. 304 (2007) 64