Organic acid-based wet etching behaviors of Ga-doped ZnO films sputter-deposited at different substrate temperatures

Thin Solid Films

Volumn 518, Issue 14, 2010, Pages 4046-4051

  Lee, Dong Kyoon ^a   Bang, Jungsik ^b   Park, Mungi ^c   Lee, Jae Ho ^a   Yang, Heesun ^a  

^a Hong Ik University   (South Korea)

^b LG Chemical Ltd   (South Korea)

^c LG Display Co Ltd   (South Korea)

Author keywords

Citric acid; Crystallinity; Etch profile; Etching mechanism; Formic acid; Ga doped zinc oxide; Substrate temperature

Indexed keywords

CRYSTALLINITIES; ETCH PROFILE; GA-DOPED; GA-DOPED ZINC OXIDE; SUBSTRATE TEMPERATURE;

ACTIVATION ENERGY; CITRIC ACID; FORMIC ACID; GALLIUM; GALLIUM ALLOYS; ORGANIC ACIDS; SUBSTRATES; ZINC; ZINC OXIDE;

WET ETCHING;

EID: 77950534823     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.01.063     Document Type: Article

References (22)

1. Minami T., and Miyata T. Thin Solid Films 517 (2008) 1474
2. Gao X.Y., Lin Q.G., Feng H.L., Liu Y.F., and Lu J.X. Thin Solid Films 517 (2009) 4684
3. Minami T. Thin Solid Films 516 (2008) 5822
4. Minami T. Thin Solid Films 516 (2008) 1314
5. Choi K.H., Jeong J.A., Kang J.W., Kim D.G., Kim J.K., Na S.I., Kim D.Y., Kim S.S., and Kim H.K. Sol. Energy Mater. Sol. Cells 93 (2009) 1248
6. Pei Z.L., Zhang X.B., Zhang G.P., Gong J., Sun C., Huang R.F., and Wen L.S. Thin Solid Films 497 (2006) 20
7. Sun J.C., Bian J.M., Liang H.W., Zhao J.Z., Hu L.Z., Zhao Z.W., Liu W.F., and Du G.T. Appl. Surf. Sci. 253 (2007) 5161
8. Chen J.J., Ren F., Norton D.P., Pearton S.J., Osinsky A., Dong J.W., and Chu S.N.G. Electrochem. Solid-State Lett. 8 (2005) G359
9. Kwon J.W., and Kim E.S. J. Microelectromech. Syst. 14 (2005) 603
10. Zhu J., Emanetoglu N.W., Chen Y., Yakshinskiy B.V., and Lu Y. J. Electron. Mater. 33 (2004) 556
11. Lee D.K., Lee S.J., Bang J., and Yang H. J. Electrochem. Soc. 156 (2009) D211
12. Ahn B.D., Oh S.H., Hong D.U., Shin D.H., Moujoud A., and Kim H.J. J. Cryst. Growth 310 (2008) 3303
13. Youssef S., Combette P., Podlecki J., Al Asmar R., and Foucaran A. Cryst. Growth Des. 9 (2009) 1088
14. Park S.M., Ikegami T., and Ebihara K. Thin Solid Films 513 (2006) 90
15. Kim K.H., Park K.C., and Ma D.Y. J. Appl. Phys. 81 (1997) 7764
16. Water W., and Chu S.Y. Mater. Lett. 55 (2002) 67
17. Song P.K., Watanabe M., Kon M., Mitsui A., and Shigesato Y. Thin Solid Films 411 (2002) 82
18. Jo W., Kim S.J., and Kim D.Y. Acta Mater. 53 (2005) 4185
19. Chen J.J., Jang S.W., Ren F., Li Y.J., Kim H.S., Norton D.P., Pearton S.J., Osinksy A., Chu S.N.G., and Weaver J.F. J. Electron. Mater. 35 (2006) 516
20. Juiken H.K., Kelly J.J., and Notten P.H.L. J. Electrochem. Soc. 133 (1986) 1217
21. Rath P., Chai J.C., Lam Y.C., Murukeshan V.M., and Zheng H. J. Heat Transfer 129 (2007) 509
22. Chahoud M. Model. Simul. Mater. Sci. Eng. 15 (2007) 441