Low temperature Al doped ZnO films on a flexible substrate by DC sputtering

Physica Status Solidi (C) Current Topics in Solid State Physics

Volumn 5, Issue 10, 2008, Pages 3344-3347

  Lee, Kyu Il ^a   Kim, Eung Kwon ^a   Kim, Hyun Duk ^a   Kang, Hyun Il ^a   Song, Joon Tae ^a  

^a Sungkyunkwan University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AL-DOPED ZNO; ATOMIC RADIUS; AZO THIN FILMS; CHARACTERISTIC DIFFERENCE; DC SPUTTERING; FLEXIBLE SUBSTRATE; GA-DOPED ZNO; IMPURITY ATOMS; LOW TEMPERATURES; RIGID SUBSTRATES; THICKNESS OF FILMS; VISIBLE SPECTRA;

ALUMINUM; OXIDE MINERALS; QUARTZ; SEMICONDUCTOR DOPING; SEMICONDUCTOR LASERS; SEMICONDUCTOR SWITCHES; SUBSTRATES; TECHNICAL PRESENTATIONS; THIN FILMS; ZINC OXIDE;

GALLIUM ALLOYS;

EID: 67650356503     PISSN: 18626351     EISSN: 16101642     Source Type: Journal    
DOI: 10.1002/pssc.200778895     Document Type: Conference Paper

References (17)

1. K. Yim and C. Lee, Cryst. Res. Technol. 41(12), 1198 (2006).
2. H. G. Lotz, P. Sauer, J. Schrer, and J. Trube, Society Vacuum Coater, 44th Annual Technical Conference, p. 172 (2001).
3. E. Fortunato, A. Goncalves, V. Assuncao, A. Marques, H. Aguas, L. Pereira, I. Ferreira, and R. Martins, Thin Solid Films 442, 121 (2003).
4. S. T. Tan, B. J. Chen, X. Sun, and W. J. Fan, J. Appl. Lett. 98, 013505 (2005).
5. A. T. Silver, A. Sanchez-Juarez, and A. Avila-Garcia, Sol. Energy Mater. Sol. Cells 55, 3 (1998).
6. P. Nunes, E. Fortunato, P. Tonello, F. Braz Fernandes, P. Vilarinho, and R. Martins, Surf. Eng. Surf. Instrument. Vacuum Technol. 64, 281 (2002)
7. E. Fortunato, M. H. Godinho, H. Santos, A. Marques, V. Assuncao, L. Pereira, H. Aguas, I. Ferreira, and R. Martins, Thin Solid Films 442, 127 (2003).
8. H. P. Klug and L. Alexander, X-Ray Diffraction Procedures for Polycrystalline and Amorphous Materials, 2nd ed. (John Wiley & Sons, New York, 1974).
9. M. Ohring, The Materials Science of Thin Films (Academic Press, 1992).
10. Z. L. Pei, X. B. Zhang, G. P. Zhang, J. Gong, C. Sun, R. F. Huang, and L. S. Wen, Thin Solid Films 497, 20 (2006).
11. L. M. Wang, Y. J. Chen, and J. W. Liao, J. Phys. Chem. Solids 69, 527 (2008).
12. J. H. Park, Y. C. Cho, J. M. Shin, S. Y. Cha, S. E. Park, and A. R. Lim, J. Koran Phys. Soc. 51, 1968 (2007).
13. A. K. Abduev, A. K. Akhmedov, and A. S. Asvarov, Sol. Energy Mater. Sol. Cells 91, 258 (2007).
14. T. Minami, S. Suzuki, and T. Miyata, Thin Solid Films 53, 398 (2001).
15. E. Fortunato, M. H. Godinho, H. Santos, A. Marques, V. Assuncao, L. Pereira, H. Aguas, I. Ferreira, and R. Martins, Thin Solid Films 442, 127 (2003).
16. E. Burstein, Phys. Rev. 93, 632 (1954).
17. Q. B. Ma, Z. Z. Ye, H. P. He, J. R. Wang, L. P. Zhi, and B. H. Zhao, Vacuum 82, 9 (2008).