Partnering analytic models and dynamic secondary ion mass spectrometry simulations to interpret depth profiles due to kiloelectronvolt cluster bombardment

Analytical Chemistry

Volumn 84, Issue 6, 2012, Pages 3010-3016

  Paruch, Robert J ^a   Garrison, Barbara J ^b   Postawa, Zbigniew ^a  

^a JAGIELLONIAN UNIVERSITY   (Poland)

^b PENNSYLVANIA STATE UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTIC MODELS; CLUSTER BEAMS; CLUSTER BOMBARDMENT; DELTA LAYERS; DEPTH PROFILE; DYNAMIC SECONDARY ION MASS SPECTROMETRY; EXPECTED VALUES; INCIDENT ENERGY; KILOELECTRONVOLT; MD SIMULATION; MOLECULAR DYNAMICS SIMULATIONS; PEAK POSITION; RMS ROUGHNESS; SPUTTERING MODELS; SPUTTERING YIELDS;

MOLECULAR DYNAMICS; SECONDARY ION MASS SPECTROMETRY;

COMPUTER SIMULATION;

EID: 84858736042     PISSN: 00032700     EISSN: None     Source Type: Journal    
DOI: 10.1021/ac300363j     Document Type: Article

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