Ar + H 2 plasma etching for improved adhesion of PVD coatings on steel substrates

Vacuum

Volumn 86, Issue 8, 2012, Pages 1165-1173

  Barshilia, Harish C ^a   Ananth, A ^a   Khan, Jakeer ^a   Srinivas, G ^a  

^a SURFACE ENGINEERING DIVISION   (India)

Author keywords

Adhesion; Ar + H 2 plasma cleaning; Nanoscratch; Sputtering; Substrate roughness; Surface modification

Indexed keywords

AFM; ATOMIC FORCE MICROSCOPIES (AFM); FIELD EMISSION SCANNING ELECTRON MICROSCOPY; MECHANICAL INTERLOCKING; NANO-SCRATCH; PHYSICAL VAPOR DEPOSITED COATINGS; PLASMA CLEANING; PLASMA TREATMENT; PVD COATINGS; STEEL SUBSTRATE; SUBSTRATE ROUGHNESS; SUBSTRATE SURFACE; TIALN COATINGS; X RAY PHOTOELECTRON SPECTROSCOPIES (XPS); XPS MEASUREMENTS;

ADHESION; ATOMIC FORCE MICROSCOPY; CARBON STEEL; PLASMA APPLICATIONS; PLASMA ETCHING; PLASMAS; SPUTTERING; STRIPPING (REMOVAL); SURFACE ROUGHNESS; SURFACE TREATMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

SUBSTRATES;

EID: 84858154466     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2011.10.028     Document Type: Article

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