Etching characteristic and mechanism of BST thin films using inductively coupled Cl2/Ar plasma with additive CF4 gas

Thin Solid Films

Volumn 459, Issue 1-2, 2004, Pages 127-130

  Kim, Gwan Ha ^a   Kim, Kyoung Tae ^a   Kim, Dong Pyo ^a   Kim, Chang Il ^a  

^a Chung Ang University   (South Korea)

Author keywords

(Ba,Sr)TiO3; Etching; Inductively coupled plasma; X Ray photoelectron spectroscopy (XPS)

Indexed keywords

BINDING ENERGY; CARBON; CHEMICAL REACTIONS; CONCENTRATION (PROCESS); ETCHING; FLUOROCARBONS; ION BOMBARDMENT; ORGANIC COMPOUNDS; SOL-GELS; THIN FILMS; TITANIUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

(BA,SR)TIO3; CF4; CHEMICAL EFFECTS; DYNAMIC RANDOM ACCESS MEMORIES (DRAM);

INDUCTIVELY COUPLED PLASMA;

EID: 2942538190     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.12.115     Document Type: Conference Paper

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