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Volumn 516, Issue 18, 2008, Pages 6071-6078
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Deposition and characterization of TiAlN/TiAlON/Si3N4 tandem absorbers prepared using reactive direct current magnetron sputtering
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Author keywords
Optical properties; Silicon nitride; Sputtering; Tandem absorber; Titanium aluminium oxinitride; Titanium aluminum nitride; Transmission electron microscopy; X ray photoelectron spectroscopy
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Indexed keywords
DC MACHINERY;
ELLIPSOMETRY;
MAGNETRON SPUTTERING;
OPTICAL PROPERTIES;
SILICON NITRIDE;
STAINLESS STEEL;
TRANSMISSION ELECTRON MICROSCOPY;
X RAY PHOTOELECTRON SPECTROSCOPY;
NIMONIC SUBSTRATES;
PHASE MODULATED ELLIPSOMETRY;
REACTIVE DIRECT CURRENT MAGNETRON SPUTTERING;
TANDEM ABSORBERS;
TITANIUM ALUMINIUM OXINITRIDE;
TITANIUM ALUMINUM NITRIDE;
TITANIUM COMPOUNDS;
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EID: 44449153669
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2007.10.113 Document Type: Article |
Times cited : (100)
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References (37)
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