Effect of hydrogen plasma precleaning on the removal of interfacial amorphous layer in the chemical vapor deposition of microcrystalline silicon films on silicon oxide surface

Applied Physics Letters

Volumn , Issue , 1995, Pages 2219-

  Park, Young Bae ^a   Rhee, Shi Woo ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

EID: 36449002674     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (16)