Optical properties of AlN thin films grown by plasma enhanced atomic layer deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 30, Issue 2, 2012, Pages

  Alevli, Mustafa ^a,b   Ozgit, Cagla ^a   Donmez, Inci ^a   Biyikli, Necmi ^a  

^a BILKENT UNIVERSITY   (Turkey)

^b MARMARA UNIVERSITY   (Turkey)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION AND PHOTOLUMINESCENCE; ALN; ALN FILMS; ALN LAYERS; ALN THIN FILMS; CRYSTALLINE ALUMINUM; DEFECT CENTERS; INFRARED REFLECTANCE SPECTRA; OPTICAL BANDS; PHONON MODE; PLASMA-ENHANCED ATOMIC LAYER DEPOSITION; ROOM TEMPERATURE; TEMPERATURE RANGE; WAVELENGTH RANGES;

ALUMINUM NITRIDE; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PHOTOLUMINESCENCE; REFRACTIVE INDEX; SPECTROSCOPIC ELLIPSOMETRY; X RAY DIFFRACTION;

ATOMIC LAYER DEPOSITION;

EID: 84858060820     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3687937     Document Type: Article

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