Fluorine functionalization of epitaxial graphene for uniform deposition of thin high-κ dielectrics

Carbon

Volumn 50, Issue 6, 2012, Pages 2307-2314

  Wheeler, Virginia ^a   Garces, Nelson ^a   Nyakiti, Luke ^a   Myers Ward, Rachael ^a   Jernigan, Glenn ^a   Culbertson, James ^a   Eddy, Charles ^a   Kurt Gaskill, D ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; FLUORINE; GRAPHENE; HALL MOBILITY;

ATOMIC-LAYER DEPOSITION; DEVICE TECHNOLOGIES; DOSE TIME; EPITAXIAL GRAPHENE; FUNCTIONALIZATIONS; GRAPHENE PROPERTIES; HIGH-Κ DIELECTRICS; OXIDE COVERAGE; OXIDE MORPHOLOGIES; UNIFORM DEPOSITION;

ATOMIC LAYER DEPOSITION;

EID: 84857808983     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2012.01.050     Document Type: Article

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