Structural and electrochemical properties of nanostructured nickel silicides by reduction and silicification of high-surface-area nickel oxide

Materials Research Bulletin

Volumn 47, Issue 3, 2012, Pages 867-877

  Chen, Xiao ^a   Zhang, Bingsen ^b   Li, Chuang ^a   Shao, Zhengfeng ^a   Su, Dangsheng ^b   Williams, Christopher T ^c   Liang, Changhai ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

^b FRITZ HABER INSTITUT DER MAX PLANCK GESELLSCHAFT   (Germany)

^c UNIVERSITY OF SOUTH CAROLINA   (United States)

Author keywords

A. Intermetallic compounds; A. Nanostructures; B. Chemical synthesis; C. Electrochemical measurements; D. Electrochemical properties

Indexed keywords

B. CHEMICAL SYNTHESIS; ELECTRICAL RESISTIVITY; ELECTROCHEMICAL MEASUREMENTS; FTIR SPECTROSCOPY; METAL-LIKE PROPERTIES; NANO-STRUCTURED; NICKEL SILICIDE; NITROGEN ADSORPTION; ROOM TEMPERATURE; SCANNING ELECTRONS; SI CONTENT;

ELECTRIC CONDUCTIVITY; ELECTROCHEMICAL PROPERTIES; ELECTRONIC DENSITY OF STATES; FUNCTIONAL MATERIALS; GAS ADSORPTION; NANOSTRUCTURES; NICKEL COMPOUNDS; NICKEL OXIDE; PRECIOUS METALS; REDUCTION; SATURATION MAGNETIZATION; SCANNING ELECTRON MICROSCOPY; SILICON; THERMOANALYSIS; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION;

SILICIDES;

EID: 84857501340     PISSN: 00255408     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.materresbull.2011.11.019     Document Type: Article

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