Reactive deposition of silicon nanowires templated on a stepped nickel surface

Journal of Physical Chemistry B

Volumn 106, Issue 50, 2002, Pages 12856-12859

  Wang, Yi ^a   Sibener, S J ^a  

^a UNIVERSITY OF CHICAGO   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

NANOWIRES;

ASPECT RATIO; DEPOSITION; NANOTECHNOLOGY; NICKEL; SCANNING TUNNELING MICROSCOPY; SILANES; SILICON;

NANOSTRUCTURED MATERIALS;

EID: 0037137621     PISSN: 10895647     EISSN: None     Source Type: Journal    
DOI: 10.1021/jp021855w     Document Type: Article

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