Interaction mechanisms between Ar-O 2 post-discharge and biphenyl

Plasma Processes and Polymers

Volumn 9, Issue 2, 2012, Pages 207-216

  Dal'Maz Silva, Walter ^a,b   Belmonte, Thierry ^a   Duday, David ^c   Frache, Gilles ^c   Noël, Cedric ^a   Choquet, Patrick ^c   Migeon, Henri Noel ^c   Maliska, Ana Maria ^b  

^a CNRS   (France)

^b FEDERAL UNIVERSITY OF SANTA CATARINA   (Brazil)

^c LUXEMBOURG INSTITUTE OF SCIENCE AND TECHNOLOGY   (Luxembourg)

Author keywords

biphenyl; films; melting point; plasma cleaning; post discharge

Indexed keywords

[4 + 2] CYCLOADDITION; AFTER-TREATMENT; ALCOHOL GROUP; ATOMIC OXYGEN; BIPHENYL; CLEAN SURFACES; ETCHING PROCESS; ETCHING RATE; INTERACTION MECHANISMS; MAIN PROCESS; PHENYL RINGS; PLASMA CLEANING; POST-DISCHARGE; PRE-TREATMENT; RING OPENING; SINGLET STATE;

ALDEHYDES; FILMS; KETONES; MELTING POINT; ORGANIC COMPOUNDS; OXYGEN; THIN FILMS;

ETCHING;

EID: 84856915908     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.201100119     Document Type: Article

References (49)

1. C. D. Pintassilgo, K. Kutasi, J. Loureiro, Plasma Sources Sci. Technol. 2007, 16, S115.
2. M. J. Pinheiro, G. Gousset, A. Granier, C. M. Ferreira, Plasma Sources Sci. Technol. 1998, 7, 524 & PSST 8 31 (1999).
3. K. Kutasi, B. Saoudi, C. D. Pintassilgo, J. Loureiro, M. Moisan, Plasma Process. Polym. 2008, 5, 840.
4. K. Kutasi, V. Guerra, P. Sa, J. Phys. D: Appl. Phys. 2010, 43, 175201.
5. V. Guerra, K. Kutasi, P. A. Sa, Appl. Phys. Lett. 2010, 96, 071503.
6. 2 flowing microwave discharges and post-discharges, Proc. of 19th International Symposium on Plasma Chemistry Bochum, Germany 2009.
7. G. Primc, R. Zaplotnik, A. Vesel, M. Mozetic, AIP Adv. 2011, 1, 022129.
8. C. Canal, F. Gaboriau, A. Ricard, M. Mozetic, U. Cvelbar, A. Drenik, Plasma Chem. Plasma Process. 2007, 27, 404.
9. A. Ricard, V. Monna, M. Mozetic, Surf. Coat. Technol. 2003, 174, 905.
10. A. Vesel, M. Mozetič, J. Phys.: Conf. Ser. 2009, 162, 012015.
11. I. Junkar, U. Cvelbar, A. Vesel, N. Hauptman, M. Mozetič, Plasma Process. Polym. 2009, 6, 667.
12. I. Junkar, U. Cvelbar, A. Vesel, M. Mozetič, S. Strnad, Vacuum 2009, 84, 83.
13. H. Yasuda, M. Gazicki, Biomaterials 1982, 3, 68.
14. J. Larrieu, B. Held, F. Clément, R. C. Hiorns, Eur. Phys. J. Appl. Phys. 2003, 22, 61.
15. M. Laroussi, Plasma Process. Polym. 2005, 2, 391.
16. G. Fridman, G. Friedman, A. Gutsol, A. B. Shekhter, V. N. Vasilets, A. Fridman, Plasma Process. Polym. 2008, 5, 503.
17. M. Moisan, J. Barbeau, M.-C. Crevier, J. Pelletier, N. Philip, B. Saoudi, Pure Appl. Chem. 2002, 74, 349.
18. S. Lerouge, M. R. Wertheimer, L'H. Yahia, Plasmas Polym. 2001, 6, 175.
19. L. Lefèvre, T. Belmonte, T. Czerwiec, A. Ricard, H. Michel, Appl. Surf. Sci. 2000, 153, 85.
20. V. Hody, T. Belmonte, C. Pintassilgo, F. Poncin-Epaillard, T. Czerwiec, G. Henrion, Y. Segui, J. Loureiro, Plasma Chem. Plasma Proc. 2006, 26, 251.
21. V. Hody, T. Belmonte, T. Czerwiec, G. Henrion, J. M. Thiébaut, Thin Solid Films 2006, 506-507, 212.
22. T. Belmonte, C. Pintassilgo, T. Czerwiec, G. Henrion, V. Hody, J. M. Thiébaut, J. Loureiro, Surf. Coat. Technol. 2005, 200, 26.
23. M. Mafra, T. Belmonte, F. Poncin-Epaillard, A. S. da Silva Sobrinho, A. Maliska, Plasma Chem. Plasma Process. 2008, 28, 495.
24. M. Mafra, T. Belmonte, A. Maliska, A. S. da Silva Sobrinho, U. Cvelbar, F. Poncin-Epaillard, Key Eng. Mater. 2008, 373-374, 421.
25. C. Noël, D. Duday, S. Verdier, P. Choquet, T. Belmonte, H.-N. Migeon, Plasma Process. Polym. 2009, 6, S187.
26. E. Bernardelli, T. Belmonte, D. Duday, G. Frache, F. Poncin-Epaillard, A. Maliska, Plasma Chem. Plasma Process. 2011, 31, 189.
27. E. Bernardelli, T. Belmonte, D. Duday, G. Frache, F. Poncin-Epaillard, A. Maliska, Plasma Chem. Plasma Process. 2011, 31, 205.
28. E. Bernardelli, A. Ricard, T. Belmonte, Plasma Sources Sci. Technol. 2011, 20, 025012
29. E. Gonzalez, M. D. Barankin, P. C. Guschl, R. F. Hicks, IEEE Trans. Plasma Sci. 2009, 37, 823.
30. F. D. Eggito, Pure Appl. Chem. 1990, 62, 1699.
31. F. D. Eggito, L. J. Matienzo, IBM J. Res. Dev. 1994, 38, 423.
32. F. D. Eggito, F. Emmi, R. S. Horwath, V. Vukanovic, J. Vac. Sci. Technol., B 1985, 3, 893.
33. L. Lefèvre, T. Belmonte, H. Michel, J. Appl. Phys. 2000, 87-10, 7497.
34. N. J. Two, M.-F. Chow, J. Rigaudy, J. Am. Chem. Soc. 1981, 103, 7218.
35. G. M. Brown, B. S. Brunschwig, C. Creutz, J. F. Endicott, N. Sutin, J. Am. Chem. Soc. 1979, 101, 1300.
36. D. Li, J. Park, J.-R. Oh, Anal. Chem. 2001, 73, 3089.
37. "Mass Spectra" by NIST Mass Spec Data Center, S.E. Stein, director. NIST chemistry WebBook, Standard Reference Database number 69, Eds. P.J. Linstrom and W.G. Mallard, National Institute of Standards and Technology, Gaithersburg MD, 20899,.
38. K. Teramura, T. Tanaka, T. Hosokawa, T. Ohuchi, M. Kani, T. Funabiki, Catal. Today 2004, 96, 205.
39. R. L. Cargill, Benjamin M. Gimarc, David M. Pond, Thomas Y. King, A. Bradford Sears, M. Robert Willcott, J. Am. Ceram. Soc. 1970, 92, 3810.
40. R. D. Vidic, M. T. Suldan, R. C. Brenner, Environ. Sci. Technol. 1993, 27, 2079.
41. F. Normand, J. Marec, Ph. Leprince, A. Granier, Mater. Sci. Eng., A 1991, 139, 103.
42. C. S. Foote, Ed., Active Oxygen in Chemistry, Chapman & Hall, London 1995, p. 114.
43. S.-P. Chan, G. Chen, X. G. Gong, Z.-F. Liu, Phys. Rev. Lett. 2003, 90, 086403.
44. A. A. Frimer, Singlet Oxygen in Peroxide Chemistry, in The Chemistry of Functional Groups, Peroxides, S. Patai, Ed., John Wiley & Sons Ltd, 1983, pp. 201-234.
45. A. A. Frimer, Chem. Rev. 1979, 79, 359.
46. D. C. Nonhebel, J. C. Walton, Free Radical Chemistry, Cambridge University Press, 1974.
47. G. da Silva, J. A. Cole, J. W. Bozzelli, J. Phys. Chem. A. 2009, 113, 6111.
48. Y. Yoshino, Y. Hayashi, T. Iwahama, S. Sakaguchi, Y. Ishii, J. Org. Chem. 1997, 62, 6810.
49. F. P. Lossing, Can. J. Chem. 1971, 49, 357.