Production of O atoms in Ar-O2 and N2- O2 microwave flowing post-discharges

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 905-908

  Ricard, A ^a   Monna, V ^a   Mozetic, M ^b  

^a Laboratoire Plasma et Conversion d'Energie   (France)

^b Institute of Surface Engineering and Optoelectronics Ljubljana   (Slovenia)

Author keywords

Catalytic probes; Nitrogen atom density; Optical spectroscopy; Oxygen atom density; Post discharge reactor

Indexed keywords

CATALYSIS; FIBER OPTICS; MICROWAVES; TITRATION;

MICROWAVE POWER;

SURFACE CHEMISTRY;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0042829164     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00405-5     Document Type: Article

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