Micromechanical modeling of the elastic behavior of multilayer thin films; Comparison with in situ data from x-ray diffraction

IUTAM Bookseries

Volumn 13, Issue , 2009, Pages 99-108

  Geandier, G ^a   Gelebart L ^b   Castelnau, O ^a   Le Bourhis, E ^c   Renault, P O ^c   Goudeau, Ph ^c   Thiaudiere D ^d  

^a CNRS   (France)

^b CEA SACLAY   (France)

^c UNIVERSITÉ DE POITIERS   (France)

^d SYNCHROTRON SOLEIL   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLOGRAPHIC ORIENTATIONS; ELASTIC BEHAVIOR; ELASTIC STIFFNESS; ELASTIC STRAIN; EXPERIMENTAL DATA; FULL-FIELD; GRAIN DISTRIBUTION; GRAIN SIZE; HOMOGENIZATION APPROACH; IN-SITU DATA; MEAN-FIELD; MICRO-MECHANICAL MODELING; MICROMECHANICAL MODEL; MODEL PREDICTION; MULTI-LAYER THIN FILM; NANOMETRIC SCALE; NANOMETRICS; PERIODIC MICROSTRUCTURE; SCALE TRANSITION; TENSILE TESTS; X-RAY DIFFRACTION DATA;

COMPOSITE MICROMECHANICS; MULTILAYERS; NANOSTRUCTURED MATERIALS; POLYCRYSTALLINE MATERIALS; TENSILE TESTING; X RAY DIFFRACTION;

NANOSYSTEMS;

EID: 84855972141     PISSN: 18753507     EISSN: None     Source Type: Book Series    
DOI: 10.1007/978-1-4020-9557-3_11     Document Type: Conference Paper

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