Elastic behavior of polycrystalline thin films inferred from in situ micromechanical testing and modeling

Applied Physics Letters

Volumn 89, Issue 6, 2006, Pages

  Faurie, D ^a,d   Renault, P O ^a   Le Bourhis, E ^a   Goudeau, Ph ^a   Castelnau, O ^b   Brenner, R ^b   Patriarche, G ^c  

^a UNIVERSITÉ DE POITIERS   (France)

^b UNIVERSITÉ PARIS 13   (France)

^c UNIV PARIS SUD   (France)

^d NETHERLANDS INSTITUTE FOR METALS RESEARCH   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; GRAIN BOUNDARIES; INCLUSIONS; MATHEMATICAL MODELS; MECHANICAL TESTING; POLYCRYSTALLINE MATERIALS; SYNCHROTRONS; X RAY DIFFRACTION;

COLUMNAR GRAINS; MICROMECHANICAL TESTING; MORPHOLOGICAL TEXTURES; POLYCRYSTALLINE THIN FILMS;

THIN FILMS;

EID: 33747130401     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2335779     Document Type: Article

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