Fe-C:H-film growth by plasma-assisted CVD from organometallic precursors

Thin Solid Films

Volumn 290-291, Issue , 1996, Pages 200-205

  Luithardt, Wolfram ^a   Benndorf, Carsten ^a  

^a UNIVERSITY OF HAMBURG   (Germany)

Author keywords

Chemical vapour deposition (CVD); X ray photoelectron spectroscopy (XPS)

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; FREE RADICALS; IRON; MASS SPECTROMETRY; ORGANOMETALLICS; PLASMA APPLICATIONS; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

QUADRUPOLE MASS SPECTROSCOPY (QMS);

AMORPHOUS FILMS;

EID: 0030399212     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09197-3     Document Type: Article

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