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Volumn 258, Issue 7, 2012, Pages 2479-2485

Effect of annealing temperature and annealing atmosphere on the structure and optical properties of ZnO thin films on sapphire (0 0 0 1) substrates by magnetron sputtering

(7) Cui, Lin a Zhang, Hua Yu a Wang, Gui Gen a Yang, Fang Xu a Kuang, Xu Ping a Sun, Rui a Han, Jie Cai a

a HARBIN INSTITUTE OF TECHNOLOGY (China)

Author keywords

Annealing; Magnetron sputtering deposition; Photoluminescence; X ray diffraction; ZnO

Indexed keywords

ANNEALING; ATMOSPHERIC TEMPERATURE; ATOMIC FORCE MICROSCOPY; FILM GROWTH; II-VI SEMICONDUCTORS; MAGNETRON SPUTTERING; METALLIC FILMS; OPTICAL FILMS; OPTICAL PROPERTIES; OXYGEN; OXYGEN VACANCIES; PHOTOLUMINESCENCE; SAPPHIRE; X RAY DIFFRACTION; ZINC OXIDE; ZINC SULFIDE;

ANNEALING ATMOSPHERES; ANNEALING CONDITION; ANNEALING TEMPERATURES; HEXAGONAL WURTZITE STRUCTURE; MAGNETRON-SPUTTERING DEPOSITION; NEAR BAND EDGE EMISSIONS; RADIO FREQUENCY MAGNETRON SPUTTERING; STRUCTURAL QUALITIES;

THIN FILMS;

EID: 84855551001 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2011.10.076 Document Type: Article

Times cited : (68)

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