Atomic scale investigation of silicon nanowires and nanoclusters

Nanoscale Research Letters

Volumn 6, Issue 1, 2011, Pages

  Roussel, Manuel ^a   Chen, Wanghua ^a   Talbot, Etienne ^a   Lardé, Rodrigue ^a   Cadel, Emmanuel ^a   Gourbilleau, Fabrice ^b   Grandidier, Bruno ^c   Stiévenard, Didier ^c   Pareige, Philippe ^a  

^a UNIVERSITÉ ET INSA DE ROUEN   (France)

^b Direction de la Recherche Fondamentale   (France)

^c INSTITUT D ELECTRONIQUE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ATOM LASERS; ATOMS; BORON COMPOUNDS; CHEMICAL VAPOR DEPOSITION; MULTILAYERS; NANOCLUSTERS; NANOWIRES; PROBES; SILICA; SILICON OXIDES; BORON; GOLD; GOLD COATINGS; GOLD DEPOSITS; SILICON COMPOUNDS;

ATOM-PROBE TOMOGRAPHY; CHEMICAL VAPOR DEPOSITION METHODS; NANOSCALE CHARACTERIZATION; SILICON NANOCLUSTERS; SILICON NANOPARTICLES; SILICON PRECURSORS; SILICON RICH SILICON OXIDES; TOMOGRAPHIC ATOM PROBES; ATOMIC SCALE; DIBORANE; LASER-ASSISTED; NANO LAYERS; P-TYPE SILICON; SILICON NANOWIRES; THERMAL-ANNEALING;

NITROGEN COMPOUNDS; ATOMS;

EID: 84255189643     PISSN: 19317573     EISSN: 1556276X     Source Type: Journal    
DOI: 10.1186/1556-276X-6-271     Document Type: Article

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