SCOPUS 정보 검색 플랫폼

Journal of Vacuum Science and Technology B:Nanotechnology and Microelectronics

Volumn 29, Issue 6, 2011, Pages

Electron beam lithography writing strategies for low loss, high confinement silicon optical waveguides

(6) Bojko, Richard J a Li, Jing a He, Li a Baehr Jones, Tom a Hochberg, Michael a Aida, Yukinori b

a University of Washington (United States)

b JEOL USA INC (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAM LITHOGRAPHY; ELECTRON BEAMS; OPTICAL WAVEGUIDES;

AVERAGING TECHNIQUE; DIRECT WRITE; EBL SYSTEMS; FIELD SHIFTS; HIGH CONFINEMENT; LOW LOSS; SIDEWALL ROUGHNESS; SILICON PHOTONICS; WAVEGUIDE LOSS; WAVEGUIDE TRANSMISSION LOSS; WRITE STRATEGY;

WAVEGUIDES;

EID: 84255172633 PISSN: 21662746 EISSN: 21662754 Source Type: Journal
DOI: 10.1116/1.3653266 Document Type: Article

Times cited : (141)

References (17)

1
- 57049183635
- Harnessing optical forces in integrated photonic circuits
- DOI 10.1038/nature07545, PII NATURE07545
- M. Li, W. H. P. Pernice, C. Xiong, T. Baehr-Jones, M. Hochberg, and H. X. Tang, Nature (London) 456, 480 (2008). 10.1038/nature07545 (Pubitemid 352759015)
- (2008) Nature , vol.456 , Issue.7221 , pp. 480-484
- Li, M.¹ Pernice, W.H.P.² Xiong, C.³ Baehr-Jones, T.⁴ Hochberg, M.⁵ Tang, H.X.⁶

2
- 77953287904
- 10.1109/JSTQE.2009.2032510
- M. Iqbal, M. A. Gleeson, B. Spaugh, F. Tybor, W. G. Gunn, M. Hochberg, T. Baehr-Jones, R. C. Bailey, and L. C. Gunn, IEEE J. Sel. Top. Quantum Electron. 16, 654 (2010). 10.1109/JSTQE.2009.2032510
- (2010) IEEE J. Sel. Top. Quantum Electron. , vol.16 , pp. 654
- Iqbal, M.¹ Gleeson, M.A.² Spaugh, B.³ Tybor, F.⁴ Gunn, W.G.⁵ Hochberg, M.⁶ Baehr-Jones, T.⁷ Bailey, R.C.⁸ Gunn, L.C.⁹

3
- 38549113495
- Nonlinear optics in photonic nanowires
- DOI 10.1364/OE.16.001300
- M. A. Foster, A. C. Turner, M. Lipson, and A. L. Gaeta, Opt. Express 16, 1300 (2008). 10.1364/OE.16.001300 (Pubitemid 351162213)
- (2008) Optics Express , vol.16 , Issue.2 , pp. 1300-1320
- Foster, M.A.¹ Turner, A.C.² Lipson, M.³ Gaeta, A.L.⁴

4
- 79953705053
- 10.1109/JSTQE.2010.2086049
- A. Mekis, S. Gloeckner, G. Masini, A. Narasimha, T. Pinguet, S. Sahni, and P. De Dobbelaere, IEEE J. Sel. Top. Quantum Electron. 17, 597 (2011). 10.1109/JSTQE.2010.2086049
- (2011) IEEE J. Sel. Top. Quantum Electron. , vol.17 , pp. 597
- Mekis, A.¹ Gloeckner, S.² Masini, G.³ Narasimha, A.⁴ Pinguet, T.⁵ Sahni, S.⁶ De Dobbelaere, P.⁷

5
- 67149097776
- 10.1049/el.2009.1353
- P. Dumon, W. Bogaerts, R. Baets, J.-M. Fedeli, and L. Fulbert, Electron. Lett. 45, 581 (2009). 10.1049/el.2009.1353
- (2009) Electron. Lett. , vol.45 , pp. 581
- Dumon, P.¹ Bogaerts, W.² Baets, R.³ Fedeli, J.-M.⁴ Fulbert, L.⁵

6
- 33845654307
- The past, present, and future of silicon photonics
- DOI 10.1109/JSTQE.2006.883151
- R. Soref, IEEE J. Sel. Top. Quantum Electron. 12, 1678 (2006). 10.1109/JSTQE.2006.883151 (Pubitemid 44956141)
- (2006) IEEE Journal on Selected Topics in Quantum Electronics , vol.12 , Issue.6 , pp. 1678-1687
- Soref, R.¹

7
- 77955219449
- 10.1038/nphoton.2010.172
- M. Hochberg and T. Baehr-Jones, Nature Photon, 4, 492 (2010). 10.1038/nphoton.2010.172
- (2010) Nature Photon , vol.4 , pp. 492
- Hochberg, M.¹ Baehr-Jones, T.²

8
- 0001039489
- 10.1063/1.1308532
- K. K. Lee, D. R. Lim, H.-C. Luan, A. Agarwal, J. Foresi, and L. C. Kimerling, Appl. Phys. Lett. 77, 1617 (2000). 10.1063/1.1308532
- (2000) Appl. Phys. Lett. , vol.77 , pp. 1617
- Lee, K.K.¹ Lim, D.R.² Luan, H.-C.³ Agarwal, A.⁴ Foresi, J.⁵ Kimerling, L.C.⁶

9
- 44149091273
- 10.1016/j.mee.2008.01.035
- S. Sardo, F. Giacometti, S. Doneda, U. Colombo, M. Di Muri, A. Donghi, R. Morson, G. Mutinati, A. Nottola, M. Gentili, and M. C. Ubaldi, Microelectron. Eng. 85, 1210 (2008). 10.1016/j.mee.2008.01.035
- (2008) Microelectron. Eng. , vol.85 , pp. 1210
- Sardo, S.¹ Giacometti, F.² Doneda, S.³ Colombo, U.⁴ Di Muri, M.⁵ Donghi, A.⁶ Morson, R.⁷ Mutinati, G.⁸ Nottola, A.⁹ Gentili, M.¹⁰ Ubaldi, M.C.¹¹

10
- 0242425719
- 10.1116/1.1603284
- W. Henschel, Y. M. Georgiev, and H. Kurz, J. Vac. Sci. Technol. B 21, 2018 (2003). 10.1116/1.1603284
- (2003) J. Vac. Sci. Technol. B , vol.21 , pp. 2018
- Henschel, W.¹ Georgiev, Y.M.² Kurz, H.³

11
- 0001749527
- 10.1364/OL.26.001888
- K. K. Lee, D. R. Lim, L. C. Kimerling, J. Shin, and F. Cerrina, Opt. Lett. 26, 1888 (2001). 10.1364/OL.26.001888
- (2001) Opt. Lett. , vol.26 , pp. 1888
- Lee, K.K.¹ Lim, D.R.² Kimerling, L.C.³ Shin, J.⁴ Cerrina, F.⁵

12
- 24744453257
- Silicon waveguide sidewall smoothing by wet chemical oxidation
- DOI 10.1109/JLT.2005.851328
- D. K. Sparacin, S. J. Spector, and L. C. Kimerling, J. Lightwave Technol. 23, 2455 (2005). 10.1109/JLT.2005.851328 (Pubitemid 41294700)
- (2005) Journal of Lightwave Technology , vol.23 , Issue.8 , pp. 2455-2461
- Sparacin, D.K.¹ Spector, S.J.² Kimerling, L.C.³

13
- 26944447884
- (IEEE, Piscataway, NJ)
- M. M. Lee, J. Yao, and M. C. Wu, 18th IEEE International Conference on Micro Electro Mechanical Systems (IEEE, Piscataway, NJ, 2005), p. 596.
- (2005) 18th IEEE International Conference on Micro Electro Mechanical Systems , pp. 596
- Lee, M.M.¹ Yao, J.² Wu, M.C.³

14
- 65749101958
- 10.1109/JLT.2008.923240
- S.-C. Hung, E.-Z. Liang, and C.-F. Lin, J. Lightwave Technol. 27, 887 (2009). 10.1109/JLT.2008.923240
- (2009) J. Lightwave Technol. , vol.27 , pp. 887
- Hung, S.-C.¹ Liang, E.-Z.² Lin, C.-F.³

15
- 78649711068
- 10.1364/OE.18.025061
- R. Ding, T. Baehr-Jones, W.-J. Kim, X. Xiong, R. Bojko, J.-M. Fedeli, M. Fournier, and M. Hochberg, Opt. Express 18, 25061 (2010). 10.1364/OE.18.025061
- (2010) Opt. Express , vol.18 , pp. 25061
- Ding, R.¹ Baehr-Jones, T.² Kim, W.-J.³ Xiong, X.⁴ Bojko, R.⁵ Fedeli, J.-M.⁶ Fournier, M.⁷ Hochberg, M.⁸

16
- 85067744949
- http://www.genisys-gmbh.com

17
- 0034316171
- Evaluation of a 100 kV thermal field emission electron-beam nanolithography system
- DOI 10.1116/1.1319707
- D. Tennant, R. Fullowan, H. Takemura, M. Isobe, and Y. Nakagawa, J. Vac. Sci. Technol. B 18, 3089 (2000). 10.1116/1.1319707 (Pubitemid 32088163)
- (2000) Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures , vol.18 , Issue.6 , pp. 3089-3094
- Tennant, D.M.¹ Fullowan, R.² Takemura, H.³ Isobe, M.⁴ Nakagawa, Y.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.