Silicon profile transformation and sidewall roughness reduction using hydrogen annealing

Proceedings of the IEEE International Conference on Micro Electro Mechanical Systems (MEMS)

Volumn , Issue , 2005, Pages 596-599

  Lee, Ming Chang M ^a   Yao, Jin ^a   Wu, Ming C ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

OPTICAL LOSS; PARAMETRIC DEPENDENCE; PROFILE TRANSFORMATION; SIDEWALL ROUGHNESS;

ANNEALING; CANTILEVER BEAMS; HYDROGEN; MATHEMATICAL MODELS; MICROSTRUCTURE; OPTICAL WAVEGUIDES; REDUCTION; SILICON ON INSULATOR TECHNOLOGY; SINGLE CRYSTALS; SURFACE ROUGHNESS;

SILICON;

EID: 26944447884     PISSN: 10846999     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MEMSYS.2005.1454000     Document Type: Conference Paper

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