Line edge roughness (LER) reduction strategy for SOI waveguides fabrication

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 1210-1213

  Sardo, Stefano ^a   Giacometti, Fabrizio ^a   Doneda, Sergio ^a   Colombo, Umberto ^a   Muri, Melissa Di ^a   Donghi, Anna ^a   Morson, Romano ^a   Mutinati, Giorgio ^a   Nottola, Alessandro ^a   Gentili, Massimo ^a   Ubaldi, Maria Chiara ^b  

^a Pirelli Labs SpA   (Italy)

^b CoreCom ^*  (Italy)

Author keywords

Index contrast; Scattering losses; Sidewall roughness

Indexed keywords

DIELECTRIC WAVEGUIDES; LIGHT PROPAGATION; OPTICAL LOSSES; SCATTERING;

FABRICATION IRREGULARITIES; INDEX CONTRAST; LINE EDGE ROUGHNESS;

SILICON ON INSULATOR TECHNOLOGY;

EID: 44149091273     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.01.035     Document Type: Article

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