Evaluation of a 100 kV thermal field emission electron-beam nanolithography system

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 6, 2000, Pages 3089-3094

  Tennant, D M ^a   Fullowan, R ^a   Takemura, H ^b   Isobe, M ^b   Nakagawa, Y ^b  

^a LUCENT TECHNOLOGIES   (United States)

^b JEOL LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMPLIFIERS (ELECTRONIC); DIGITAL TO ANALOG CONVERSION; ELECTRON EMISSION; ELECTRON OPTICS; NANOTECHNOLOGY; THERMODYNAMIC STABILITY;

ELECTRON OPTICAL COLUMNS; FIELD EMISSION GUNS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0034316171     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1319707     Document Type: Article

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