Silicon waveguide sidewall smoothing by KrF excimer laser reformation

Journal of Lightwave Technology

Volumn 27, Issue 7, 2009, Pages 887-892

  Hung, Shih Che ^a   Liang, Eih Zhe ^b   Lin, Ching Fuh ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b DIWAN COLLEGE OF MANAGEMENT   (Taiwan)

Author keywords

Excimer laser; Roughness; Si microphotonics; Waveguide

Indexed keywords

CRYSTAL QUALITIES; INCIDENT ANGLES; KRF EXCIMER LASER; LASER ILLUMINATION; MICROWAVE REFLECTION; PHOTOCONDUCTANCE; ROOT MEAN SQUARE ROUGHNESS; ROUGHNESS; SCATTERING LOSS; SI MICROPHOTONICS; SILICON WAVEGUIDE;

EXCIMER LASERS; GAS LASERS; KRYPTON; PHOTORESISTS; SEMICONDUCTING SILICON COMPOUNDS; SURFACE ROUGHNESS; WAVEGUIDES;

SILICON WAFERS;

EID: 65749101958     PISSN: 07338724     EISSN: None     Source Type: Journal    
DOI: 10.1109/JLT.2008.923240     Document Type: Article

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