Silicon waveguide sidewall smoothing by wet chemical oxidation

Journal of Lightwave Technology

Volumn 23, Issue 8, 2005, Pages 2455-2461

  Sparacin, Daniel K ^a   Spector, Steven J ^b   Kimerling, Lionel C ^a  

^a Massachusetts Institute of Technology   (United States)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Oxidation smoothing; Roughness; Si microphotonics; Silicon on insulator (SOI); Waveguide

Indexed keywords

COMPUTER SIMULATION; FINITE DIFFERENCE METHOD; LIGHT REFLECTION; LIGHT SCATTERING; LIGHT TRANSMISSION; OXIDATION; SILICON ON INSULATOR TECHNOLOGY; SINGLE CRYSTALS; SURFACE ROUGHNESS; TIME DOMAIN ANALYSIS;

OXIDATION SMOOTHING; SILICON MICROPHOTONICS; SILICON WAVEGUIDE; WAVEGUIDE TRANSMISSION LOSS; WET CHEMICAL OXIDATION;

OPTICAL WAVEGUIDES;

EID: 24744453257     PISSN: 07338724     EISSN: None     Source Type: Journal    
DOI: 10.1109/JLT.2005.851328     Document Type: Article

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