Dielectric constants by multifrequency non-contact atomic force microscopy

Nanotechnology

Volumn 23, Issue 2, 2012, Pages

  Kumar, Bharat ^a   Bonvallet, Joseph C ^a   Crittenden, Scott R ^a  

^a UNIVERSITY OF SOUTH CAROLINA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTIC EXPRESSIONS; APPLIED POTENTIALS; BENDING MODES; CANTILEVER OSCILLATION; CAPACITIVE FORCES; CAPACITIVE MEASUREMENTS; DIELECTRIC CONSTANTS; DRY CONDITION; EXPERIMENTAL DATA; HIGH FIELD; HIGH Q FACTOR; METALLIC SUBSTRATE; MULTI FREQUENCY; NONCONTACT ATOMIC FORCE MICROSCOPY; THIOL MOLECULES;

ATOMIC FORCE MICROSCOPY; NANOCANTILEVERS; SILICON COMPOUNDS; SUBSTRATES; ULTRATHIN FILMS;

SELF ASSEMBLED MONOLAYERS;

METAL; THIOL DERIVATIVE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CHEMISTRY; ELECTRIC CAPACITANCE; METHODOLOGY;

ELECTRIC CAPACITANCE; METALS; MICROSCOPY, ATOMIC FORCE; SULFHYDRYL COMPOUNDS;

EID: 83755161602     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/23/2/025707     Document Type: Article

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