Quantitative dielectric constant measurement of thin films by DC electrostatic force microscopy

Nanotechnology

Volumn 20, Issue 39, 2009, Pages

  Gramse, G ^a   Casuso, I ^b   Toset, J ^a   Fumagalli, L ^a   Gomila, G ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

^b INSTITUT CURIE   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTICAL MODEL; ATOMIC FORCE MICROSCOPES; CAPACITANCE MICROSCOPY; DIELECTRIC CONSTANTS; ELECTROSTATIC FORCE MICROSCOPY; FORCE DETECTION; NANO SCALE; NANOMETRICS; PURPLE MEMBRANES; SEMICONDUCTOR TECHNOLOGY; SILICON DIOXIDE FILM; SIMPLE METHOD; SPATIAL RESOLUTION;

DIELECTRIC WAVEGUIDES; ELECTROSTATIC DEVICES; ELECTROSTATIC FORCE; FORCE MEASUREMENT; MONOLAYERS; PERMITTIVITY; SEMICONDUCTOR DEVICE MANUFACTURE; SILICA; THIN FILMS;

CERAMIC CAPACITORS;

SILICON DIOXIDE;

ANALYTIC METHOD; ARTICLE; ATOMIC FORCE MICROSCOPY; BIOPHYSICS; CONTROLLED STUDY; DIELECTRIC CONSTANT; ELECTRIC CAPACITANCE; ELECTRICITY; NANOANALYSIS; NANOIMAGING; PRIORITY JOURNAL; PURPLE MEMBRANE; SCANNING FORCE MICROSCOPY; SEMICONDUCTOR; THEORETICAL MODEL; VALIDATION STUDY; ALGORITHM; METHODOLOGY; REGRESSION ANALYSIS; REPRODUCIBILITY; STATIC ELECTRICITY;

ALGORITHMS; LEAST-SQUARES ANALYSIS; MICROSCOPY, ATOMIC FORCE; MODELS, THEORETICAL; REPRODUCIBILITY OF RESULTS; STATIC ELECTRICITY;

EID: 70349105114     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/20/39/395702     Document Type: Article

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