Wideband anti-reflective micro/nano dual-scale structures: Fabrication and optical properties

Micro and Nano Letters

Volumn 6, Issue 11, 2011, Pages 947-950

  Zhang, Xiaosheng ^a   Di, Qianli ^a   Zhu, Fuyun ^a   Sun, Guangyi ^b   Zhang, Haixia ^a  

^a PEKING UNIVERSITY   (China)

^b UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPIC WET ETCHING; ANTI-REFLECTANCE; BLACK SILICON; DEEP REACTIVE ION ETCHING; GEOMETRY SIZE; HIGH ASPECT RATIO; HIGHLY DENSE; INCIDENT LIGHT; LIGHT TRAP; MASK LESS; NEAR INFRARED REGION; OPTICAL CHARACTERISTICS; OPTICAL REFLECTANCE; SOLAR SPECTRUM; TOTAL LIGHT ABSORPTION; V-SHAPED GROOVES; WIDE-BAND;

ASPECT RATIO; FABRICATION; MICROSTRUCTURE; NANOSTRUCTURES; REACTIVE ION ETCHING; REFLECTION; WET ETCHING;

OPTICAL PROPERTIES;

ION; NANOMATERIAL; SILICON;

ARTICLE; CHEMICAL REACTION; GEOMETRY; LIGHT ABSORPTION; MICROTECHNOLOGY; NANOARRAY; NANOFABRICATION; NEAR INFRARED REFLECTANCE SPECTROSCOPY; OPTICS; REFLECTOMETRY; SPECTRAL SENSITIVITY; ULTRAVIOLET RADIATION;

EID: 82955219740     PISSN: None     EISSN: 17500443     Source Type: Journal    
DOI: 10.1049/mnl.2011.0487     Document Type: Article

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