|
Volumn 21, Issue 38, 2011, Pages 14461-14465
|
Atomic layer deposition of metal fluorides through oxide chemistry
|
Author keywords
[No Author keywords available]
|
Indexed keywords
ATOMIC LAYER DEPOSITION;
ATOMIC SPECTROSCOPY;
ATOMS;
CALCIUM;
FLUORINE;
FLUORINE COMPOUNDS;
LANTHANUM OXIDES;
MAGNESIUM;
METALLIC COMPOUNDS;
OZONE;
REFRACTIVE INDEX;
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
STOICHIOMETRY;
DETECTION LIMITS;
FILM STOICHIOMETRY;
FLUORINE SOURCE;
LANTHANUM FLUORIDE;
METAL FLUORIDE;
METAL PRECURSOR;
METAL-OXIDE FORMATION;
OXYGEN CONTENT;
OXYGEN SOURCES;
METALS;
|
EID: 81855172289
PISSN: 09599428
EISSN: 13645501
Source Type: Journal
DOI: 10.1039/c1jm11825k Document Type: Article |
Times cited : (34)
|
References (24)
|