The structural properties of Al doped ZnO films depending on the thickness and their effect on the electrical properties

Applied Surface Science

Volumn 258, Issue 4, 2011, Pages 1283-1289

  Ri, Kang Hyon ^a   Wang, Yunbo ^a   Zhou, Wen Li ^a   Gao, Jun Xiong ^a   Wang, Xiao Jing ^a   Yu, Jun ^a  

^a HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Al doped zinc oxide; Film thickness; Transparent conducting film

Indexed keywords

ALUMINA; ALUMINUM OXIDE; CARRIER CONCENTRATION; COMPRESSIVE STRESS; DEPOSITION; FILM THICKNESS; GRAIN BOUNDARIES; GRAIN GROWTH; GRAIN SIZE AND SHAPE; II-VI SEMICONDUCTORS; SEMICONDUCTOR DOPING; ZINC OXIDE;

AL-DOPED ZINC OXIDE; CHEMISORBED OXYGEN; CRYSTALLINITIES; DEPOSITION TEMPERATURES; PROPERTIES OF AL; R.F. MAGNETRON SPUTTERING; STRUCTURAL AND ELECTRICAL PROPERTIES; TRANSPARENT CONDUCTING FILMS;

FILM GROWTH;

EID: 81555214107     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2011.07.022     Document Type: Article

References (33)

1. X. Xiu, Z. Pang, M. Lv, Y. Dai, L. Ye, and S. Han Appl. Surf. Sci. 253 2007 3345
2. B.C. Mohanty, Y.H. Jo, D.H. Yeon, I.J. Choi, and Y.S. Cho Appl. Phys. Lett. 95 2009 062103
3. E. Fortunato, V. Assuncao, A. Goncalves, A. Marques, H. Aguas, L. Pereira, I. Ferreira, P. Vilarinho, and R. Martins Thin Solid Films 451-452 2004 443
4. B. Cullity Elements of X-ray Diffraction 1959 Addison-Wesley London p. 99
5. [5] JCPDS Card No. 36-1451.
6. B.S. Yau, J.L. Huang, and M.C. Kan J. Mater. Res. 18 2003 1985
7. J.A. Thornton, and D.W. Hoffman Thin Solid Films 171 1989 5
8. R. Cebulla, R. Wendt, and K. Ellmer J. Appl. Phys. 83 1998 1087
9. A. Fouchet, W. Prellier, B. Mercey, L. Méchin, V.N. Kulkarni, and T. Venkatesan J. Appl. Phys. 96 2004 3228
10. A. van der Drift Philips Res. Rep. 22 1967 626
11. S. Zhao, F. Ma, Z. Song, and K. Xu Mater. Sci. Eng. A 474 2008 134
12. N. Schell, T. Jensen, J.H. Petersen, K.P. Andreasen, J. Bøttiger, and J. Chevallier Thin Solid Films 441 2003 96
13. P. Chaudhari J. Vac. Sci. Technol. 9 1972 520
14. R. Abermann, and R. Koch Thin Solid Films 142 1986 65
15. M.N. Islam, T.B. Ghosh, K.L. Chopra, and H.N. Acharya Thin Solid Films 280 1996 20
16. M. Chen, X. Wang, Y.H. Yu, Z.L. Pei, X.D. Bai, C. Sun, R.F. Huang, and L.S. Wen Appl. Surf. Sci. 158 2000 134
17. B.G. Choi, I.H. Kim, D.H. Kim, K.S. Lee, T.S. Lee, B. Cheong, Y.-J. Baik, and W.M. Kim J. Eur. Ceram. Soc. 25 2005 2161
18. S.-S. Lin, J.-L. Huang, and P. Sajgalik Surf. Coat. Technol. 190 2005 39
19. D.H. Zhang, and H.L. Ma Appl. Phys. A 62 1996 487
20. J.E. Morris, M.I. Ridge, C.A. Bishop, and R.P. Howson J. Appl. Phys. 51 1980 1847
21. M. Mizuhashi Jpn. J. Appl. Phys., Part 1 22 1983 615
22. R.B.H. Tahar, T. Ban, Y. Ohya, and Y. Takahashi J. Appl. Phys. 82 1997 865
23. K.F. Huang, T.M. Uen, Y.S. Gou, C.R. Hiang, and L.C. Yang Thin Solid Films 148 1987 7
24. K. Ellmer J. Phys. D: Appl. Phys. 34 2001 3097
25. B. Houng, C.Sh. Hsi, B.Y. Hou, and Sh.L. Fu Vacuum 83 2009 534
26. R.B.H. Tahar, T. Ban, Y. Ohya, and Y. Takahashi J. Appl. Phys. 83 1998 2631
27. B. Houng, C.S. Hsi, B.Y. Hou, and S.L. Fu J. Alloys Compd. 456 2008 64
28. K. Ellmer, and R. Mientus Thin Solid Films 516 2008 4620
29. C. Lennon, R. Kodama, and Y. Chang Vac. Sci. Technol. B 27 2009 1641
30. J.C. Lin, K.C. Peng, and C.A. Tseng Surf. Coat. Technol. 202 2008 5480
31. B.K. Shin, T.I. Lee, and J.P. Kar Mater. Sci. Semicond. Process. 2011
32. M.N. Islam, T.B. Ghosh, and K.L. Chopra Thin Solid Films 280 1996 20
33. L. Li, L. Fang, X.J. Zhou, Z.Y. Liu, L. Zhao, and S. Jiang J. Electron Spectrosc. Relat. Phenom. 173 2009 7