Plasma polymerization at different positions in an asymmetric ethylene discharge

Journal of Physics D: Applied Physics

Volumn 44, Issue 47, 2011, Pages

  Trieschmann, Jan ^a,b   Hegemann, Dirk ^b  

^a RUHR UNIVERSITY BOCHUM   (Germany)

^b SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CAPACITIVELY COUPLED PLASMAS; DOUBLE-SIDED COATING; ENERGY DENSITY; ENERGY INPUTS; EXACT PLACEMENT; FILM DENSITY; FILM PROPERTIES; FLOATING CONDITIONS; GLASS SLIDES; PLASMA BULK; PLASMA ZONE;

COATINGS; DEPOSITION RATES; ELECTRIC DISCHARGES; ETHYLENE; FILM GROWTH; PLASMA DEPOSITION; PLASMA SHEATHS;

PLASMA POLYMERIZATION;

EID: 81155151269     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/44/47/475201     Document Type: Article

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