Activation energy of an asymmetrical, radio frequency discharge with methane

Thin Solid Films

Volumn 491, Issue 1-2, 2005, Pages 96-103

  Hegemann, D ^a   Schutz U ^a  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

Macroscopic kinetics; Methane; Plasma length; Plasma processing and deposition

Indexed keywords

COATINGS; METHANE; MONOMERS; OPTIMIZATION; PLASMA POLYMERIZATION;

MACROSCOPIC KINETICS; PLASMA LENGTH; PLASMA PROCESSES; PLASMA PROCESSING AND DEPOSITION;

ACTIVATION ENERGY;

EID: 25144466666     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.05.041     Document Type: Article

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