Influence of gas phase and surface reactions on plasma polymerization

Surface and Coatings Technology

Volumn 205, Issue SUPPL. 2, 2011, Pages

  Guimond, Sébastien ^a   Schütz, Urs ^a   Hanselmann, Barbara ^a   Körner, Enrico ^a   Hegemann, Dirk ^a  

^a SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

Author keywords

A C:H:N; Deposition rate; Functional groups; Ion bombardment; RF plasma

Indexed keywords

DEPOSITION RATES; FILM GROWTH; FLOW OF GASES; FUNCTIONAL GROUPS; GASES; ION BOMBARDMENT; PROCESS CONTROL; SURFACE REACTIONS; THIN FILMS;

DIFFERENT SIZES; FILM-FORMING SPECIES; MULTISTEP REACTIONS; PLASMA POLYMERS; PLASMA REACTORS; POLYMERIZATION PROCESS; REACTION PARAMETERS; RF PLASMA;

PLASMA POLYMERIZATION;

EID: 79959781857     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.03.093     Document Type: Article

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