Electron release in the afterglow of a pulsed inductively-coupled radiofrequency oxygen plasma

Plasma Sources Science and Technology

Volumn 15, Issue 2, 2006, Pages 171-177

  Brockhaus, A ^a   Leu, G F ^a   Selenin, V ^a   Tarnev, Kh ^a,b   Engemann, J ^a  

^a UNIVERSITY OF WUPPERTAL   (Germany)

^b TECHNICAL UNIVERSITY OF SOFIA   (Bulgaria)

Author keywords

[No Author keywords available]

Indexed keywords

CARRIER CONCENTRATION; ELECTRON TRANSITIONS; FLUID MECHANICS; INTERFEROMETRY; MATHEMATICAL MODELS; MICROWAVES; OXYGEN; PRESSURE EFFECTS;

FLUID MODELS; FREE ELECTRONS; RADIOFREQUENCY OXYGEN PLASMAS; WIDE PRESSURE RANGE;

PLASMAS;

EID: 33646370468     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/15/2/001     Document Type: Conference Paper

References (14)

1. Franklin R N 2001 J. Phys. D: Appl. Phys. 34 1834
2. Panda S, Economou D J and Meyyappan M 2000 J. Appl. Phys. 87 8323-33
3. Hargis P J et al 1994 Rev. Sci. Instrum. 65 140
4. Gudmundsson J T, Marakhtanov A M, Patel K K, Gopinath V P and Lieberman M A 2000 J. Phys. D: Appl. Phys. 33 1323-31
5. Baeva M, Luo X, Pfelzer B, Repsilber T and Uhlenbusch J 2000 Plasma Sources Sci. Technol. 9 128-45
6. Berezhnoj S V, Shin C B, Buddemeier U and Kaganovich I 2000 Appl. Phys. Lett. 77 800-2
7. Hays G N, Tracy C J and Oskam H J 1974 J. Chem. Phys. 60 2027-34
8. Franklin R N 2002 J. Phys. D: Appl. Phys. 35 2270
9. Franklin R N 2004 J. Phys. D: Appl. Phys. 37 1342
10. Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing 2nd edn (Hoboken, New Jersey: Wiley Interscience)
11. Greenberg K E and Hebner G A 1993 J. Appl. Phys. 73 8126
12. Katsch H M, Manthey C and Döbele H F 2003 Plasma Sources Sci. Technol. 12 475
13. Belostotsky S G, Economou D J, Lopaev D V and Rakhimova T V 2005 Plasma Sources Sci. Technol. 14 532-42
14. Corr C S, Steen P G and Graham W G 2003 Plasma Sources Sci. Technol. 12 265