Selective sputtering and atomic resolution imaging of atomically thin boron nitride membranes

Nano Letters

Volumn 9, Issue 7, 2009, Pages 2683-2689

  Meyer, Jannik C ^a   Chuvilin, Andrey ^a   Algara Siller, Gerardo ^a   Biskupek, Johannes ^a   Kaiser, Ute ^a  

^a UNIVERSITY OF ULM   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC-RESOLUTION IMAGING; BEAM ENERGIES; CRYSTALLOGRAPHIC ORIENTATIONS; DAMAGE MECHANISM; GRAPHENE; HEXAGONAL BORON NITRIDE; HIGH ENERGY ELECTRON BEAMS; NITRIDE MEMBRANES; SELECTIVE SPUTTERING; SHAPED HOLES; SINGLE LAYER;

ATOMS; BORON; ELECTRON BEAMS; NITRIDES; TWO DIMENSIONAL;

BORON NITRIDE;

BORON DERIVATIVE; ELBOR; GRAPHITE;

ARTICLE; CHEMICAL MODEL; CHEMISTRY; SURFACE PROPERTY; TRANSMISSION ELECTRON MICROSCOPY;

BORON COMPOUNDS; GRAPHITE; MICROSCOPY, ELECTRON, TRANSMISSION; MODELS, CHEMICAL; SURFACE PROPERTIES;

EID: 67650361317     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl9011497     Document Type: Article

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