Prerequisites for a Cc/Cs-corrected ultrahigh-resolution TEM

Ultramicroscopy

Volumn 108, Issue 3, 2008, Pages 167-178

  Haider, M ^a   Muller H ^a   Uhlemann, S ^a   Zach, J ^a   Loebau, U ^a   Hoeschen, R ^b  

^a CEOS GmbH   (Germany)

^b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

Author keywords

Aberration correction; Electron microscope design; High resolution TEM; Particle optics

Indexed keywords

ABERRATIONS; OPTICAL RESOLVING POWER; PARTICLE OPTICS;

ABERRATION CORRECTION; ELECTRIC STABILITY; ELECTRON MICROSCOPE DESIGN; IMAGING DEVICE; SCANNING TRANSMISSION ELECTRON MICROSCOPY;

TRANSMISSION ELECTRON MICROSCOPY;

ACCURACY; ARTICLE; ELECTRONICS; FREQUENCY ANALYSIS; IMAGING SYSTEM; MATHEMATICAL ANALYSIS; SCANNING ELECTRON MICROSCOPY; TRANSMISSION ELECTRON MICROSCOPY;

EID: 38349139261     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2007.07.007     Document Type: Article

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