Ultrathin ultrananocrystalline diamond film synthesis by direct current plasma-assisted chemical vapor deposition

Journal of Applied Physics

Volumn 110, Issue 8, 2011, Pages

  Lee, Hak Joo ^a,b   Jeon, Hyeongtag ^b   Lee, Wook Seong ^a  

^a Korea Institute of Science and Technology   (South Korea)

^b Hanyang University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; DC PLASMA; DENSITY VARIATIONS; DIRECT CURRENT; ELECTROPHORETIC LIGHT SCATTERING; FTIR; GRAIN SIZE; GROWTH STAGES; HIGH-RESOLUTION SCANNING ELECTRON MICROSCOPES; HOT FILAMENT; MICROWAVE PLASMA; NANO DIAMOND; NEAR EDGE X-RAY ABSORPTION FINE STRUCTURES; PLASMA-ASSISTED CHEMICAL VAPOR DEPOSITION; PRE-TREATMENT; PRE-TREATMENTS; RELATIVE VALUE; SECONDARY NUCLEATION; SEEDING PROCESS; SUBSTRATE PRE-TREATMENTS; SUBSTRATE SURFACE; SURFACE TERMINATION; ULTRA-NANOCRYSTALLINE DIAMOND; ULTRA-THIN; ULTRANANOCRYSTALLINE DIAMOND FILMS; VOID-FREE;

ABSORPTION SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; HYDROCARBONS; MIRRORS; PLASMA DEPOSITION; PLASMAS; POWDERS; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SEED; SUBSTRATES; SYNTHETIC DIAMONDS; ZETA POTENTIAL;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 80655141566     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3652752     Document Type: Article

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