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Volumn 19, Issue 10, 2010, Pages 1168-1171
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The 8-inch free-standing CVD diamond wafer fabricated by DC-PACVD
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Author keywords
DC PACVD; Diamond thick film; Free standing diamond wafer; Large area
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Indexed keywords
CHAMBER PRESSURE;
CRYSTALLINITIES;
CVD DIAMOND;
DC-PACVD;
DEPOSITION TECHNOLOGY;
DIAMOND PEAKS;
DIAMOND THICK FILM;
DISCHARGE CURRENTS;
DISCHARGE VOLTAGES;
ELECTRODE CONFIGURATIONS;
FREE-STANDING DIAMOND WAFER;
GAS FLOWRATE;
HYDROGEN GAS;
LARGE-AREA;
SCALE-UP;
SEM;
SUBSTRATE TEMPERATURE;
THERMAL-WAVE TECHNIQUES;
WAFER SURFACE;
DIAMOND FILMS;
HYDROGEN;
METHANE;
OPTICAL MICROSCOPY;
RAMAN SPECTROSCOPY;
THERMAL CONDUCTIVITY;
THERMOANALYSIS;
THICK FILMS;
DIAMONDS;
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EID: 77956058966
PISSN: 09259635
EISSN: None
Source Type: Journal
DOI: 10.1016/j.diamond.2010.05.002 Document Type: Article |
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Times cited : (26)
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References (11)
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