Formation of continuous nanocrystalline diamond layers on glass and silicon at low temperatures

Chemical Vapor Deposition

Volumn 14, Issue 7-8 SPEC. ISS., 2008, Pages 181-186

  Kromka, Alexander ^a   Rezek, Bohuslav ^a   Remes, Zdenek ^a   Michalka, Miroslav ^b   Ledinsky, Martin ^a   Zemek, Josef ^a   Potmesil, Jiri ^a   Vanecek, Milan ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b INTERNATIONAL LASER CENTER   (Slovakia)

Author keywords

AFM; Low temperature growth; Nanocrystalline diamond; SEM; XPS

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON CLUSTERS; CHEMICAL VAPOR DEPOSITION; CRYSTALLOGRAPHY; CRYSTALS; DIAMONDS; EPITAXIAL GROWTH; GLASS; HYDROGEN; METHANE; MICROSCOPIC EXAMINATION; MICROWAVES; NANOCRYSTALLINE ALLOYS; NANOCRYSTALLINE MATERIALS; NANOCRYSTALLINE SILICON; NANOSTRUCTURED MATERIALS; OPTICAL PROPERTIES; PHOTOELECTRON SPECTROSCOPY; POWDERS; REFRACTIVE INDEX; SECONDARY EMISSION; SEMICONDUCTING SILICON COMPOUNDS; SILICON; SUBSTRATES; SURFACE ROUGHNESS; THICK FILMS; THIN FILMS; TWO DIMENSIONAL; X RAY PHOTOELECTRON SPECTROSCOPY;

AFM; LOW TEMPERATURE GROWTH; NANOCRYSTALLINE DIAMOND; SEM; XPS;

DIAMOND FILMS;

EID: 54949135239     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200706662     Document Type: Article

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