Comparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm nodes

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 9, Issue 4, 2010, Pages

  Bekaert, Joost ^a   Van Look, Lieve ^a   Truffert, Vincent ^a   Lazzarino, Frederic ^a   Vandenberghe, Geert ^a   Reybrouck, Mario ^b   Tarutani, Shinji ^c  

^a IMEC   (Belgium)

^b FUJIFILM Electronic Materials EU   (Belgium)

^c FUJIFILM CORPORATION   (Japan)

Author keywords

ArF lithography extendibility; Contact layer; Double exposure; Image reversal; Metal layer; Negative tone development; Resolution enhancement

Indexed keywords

NANOTECHNOLOGY; PRINTING;

ARF LITHOGRAPHY; CONTACT LAYER; DOUBLE EXPOSURE; IMAGE REVERSAL; METAL LAYER; NEGATIVE TONES; RESOLUTION ENHANCEMENT;

LITHOGRAPHY;

EID: 80455124038     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3524829     Document Type: Article

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