Freeform illumination sources: An experimental study of source-mask optimization for 22-nm SRAM cells

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7640, Issue , 2010, Pages

  Bekaert, J ^a   Laenens, B ^a   Verhaegen, S ^a   Van Look, L ^a   Trivkovic, D ^a   Lazzarino, F ^a   Vandenberghe, G ^a   Van Adrichem, P ^b,c   Socha, R ^b   Baron, S ^b   Tsai, M C ^b   Ning, K ^b   Hsu, S ^b   Liu, H Y ^b   Mulder, M ^c   Bouma, A ^c   Van Der Heijden, E ^c   Mouraille, O ^c   Schreel, K ^c   Finders, J ^c   Dusa, M ^c   Zimmermann, J ^d   Graupner P ^d   Neumann, J T ^d   Hennerkes, C ^d   more..

^a IMEC   (Belgium)

^b ASML US Inc   (United States)

^c ASML   (Netherlands)

^d CARL ZEISS SMT AG   (Germany)

Author keywords

FlexRay; freeform illumination; negative tone development; SMO; source mask optimization; SRAM

Indexed keywords

MASKS;

FLEXRAY; FREEFORM ILLUMINATIONS; NEGATIVE TONE DEVELOPMENT; SMO; SOURCE-MASK OPTIMIZATIONS;

STATIC RANDOM ACCESS STORAGE;

EID: 84905509250     PISSN: 0277786X     EISSN: 1996756X     Source Type: Conference Proceeding    
DOI: 10.1117/12.846918     Document Type: Conference Paper

References (10)

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10. Finders, J. et al., "Litho and patterning challenges for memory and logic applications at the 22-nm node," Proc. SPIE 7640, 7640-11 (2010).