Materials and processes of negative tone development for double patterning process

Journal of Photopolymer Science and Technology

Volumn 22, Issue 5, 2009, Pages 635-640

  Tarutani, Shinji ^a   Tsubaki, Hideaki ^a   Kamimura, Sou ^a  

^a FUJIFILM CORPORATION   (Japan)

Author keywords

193 nm immersion lithography; CD uniformity; Defectivity; Double patterning; Fine trench imaging; Negative tone imaging

Indexed keywords

EID: 77952048154     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.22.635     Document Type: Article

References (15)

1. John Warlaumont: SEMATECH Litho Forum, (2008)
2. Todd R. Younkin: SEMATECH Litho Forum, (2008)
3. Hidefumi Mukai, Eishi Shiobara, Shinya Takahashi, Kohji Hashimoto: Proc. SPIE, 6924, (2008) 692406
4. Hyun-Woo Kim, Myeong-Cheol Kim, Suk-Joo Lee, Don-Hwa Kwak, Hyung-Do Kim, Chang-Min Park, Dae-Yup Lee, Sung-Won Choi, Chang-Jin Kang, Woo-Sung Han: 5 th International Symposium on Immersion Lithography Extensions, (2008)O-DP-01
5. Chris Cork, Brian Ward, Levi Barnes, Ben Painter, Kevin Lucas, Gerry Luk-Pat, Vincent Wiaux, Staf Verhaegen, Mireille Maenhoudt: Proc. SPIE, 6925 (2008) 69251Q-1
6. Nikolaos Bekiaris, Hiram Cervera, Junyan Dai, Ryoung-han Kim, Alden Acheta, Thomas Wallow, Jongwook Kye, Harry J. Levinson, Thomas Nowak, and James Yu: Proc. SPIE, 6923, (2008)692321
7. Masafumi Hori, Tomoki Nagai, Atsushi Nakamura, Takayoshi Abe, Gouji Wakamatsu, Tomohiro Kakizawa, Yuusuke Anno, Makoto Sugiura, Shiro Kusumoto, Yoshikazu Yamaguchi, and Tsutomu Shimokawa: Proc. SPIE, 6923, (2008) 69230H
8. Kuang-Jung Rex Chen, Wu-Song Huang, Wai-Kin Li, and P. Rao Varanasi: Proc. SPIE, 6923, (2008) 69230G
9. M. Maenhoudt, R. Gronheid, N. Stepanenko, T. Matsuda, and D. Vangoidsenhoven: Proc. SPIE 6924, (2008) 69240P
10. Shinji Tarutani, Hideaki Tsubaki, and Shinichi Kanna: Proc. SPIE, 6923, (2008) 69230F
11. Takashi Hattori, Yoshiyuki Yokoyama, Kaori Kimura, Ryoko Yamanaka, Toshihiko Tanaka, and Hiroshi Fukuda: Proc. SPIE, 5039, (2003) 175
12. Shinji Tarutani, Shinichi Kanna, and Hideaki Tsubaki: 5th International Symposium on Immersion Lithography Extensions, (2008) O-DM-06
13. Joost Bekaert, Mireille Maenhoudt, Geert Vandenberghe, Mario Reybrouck: 5th International Symposium on Immersion Lithography Extensions, (2008) O-DS-02
14. Sophie Bernard, Carlos Fonseca, Roel Gronheid, Shinichi Hatakeyama, Michael Leeson, Kathleen Nafus, Steven Scheer, Mark Somervell: 5th International Symposium on Immersion Lithography Extensions, (2008) O-DM-03
15. Carlos A. Fonseca, Mark Somervell, Sophie Bernard, Hatakeyama Shinichi, Kathleen Nafus, Michael Leeson, Steven Scheer, Roel Gronheid: 5th International Symposium on Immersion Lithography Extensions, (2008) P-DM-07