Ultimate contact hole resolution using immersion lithography with line/space imaging

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Truffert, V ^a   Bekaert, J ^a   Lazzarino, F ^a   Maenhoudt, M ^a   Miller, A ^a   Moelants, M ^a   Wu, T ^b  

^a IMEC   (Belgium)

^b TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY   (Taiwan)

Author keywords

Contact holes; Dipole illumination; Double exposure; Image reversal; Immersion; K1; Light field mask; Negative tone development; Process

Indexed keywords

CONTACT HOLES; DIPOLE ILLUMINATION; DOUBLE EXPOSURE; IMAGE REVERSAL; IMMERSION; K1; LIGHT FIELD MASK; NEGATIVE TONE DEVELOPMENT; PROCESS;

PLANTS (BOTANY); SCANNING;

PHOTOLITHOGRAPHY;

EID: 65849280982     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814867     Document Type: Conference Paper

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