Freezing materials for double patterning

Journal of Photopolymer Science and Technology

Volumn 22, Issue 5, 2009, Pages 653-661

  Lee, Dong Kwan ^a   Cao, Yi ^a   Abdallah, David ^a   Yin, Jian ^a   Thiyagarajan, Muthiah ^a   Dammel, Ralph R ^a  

^a AZ Electronic Materials USA Corp   (United States)

Author keywords

ArF lithography; Double patterning; Freezing; Photoresist

Indexed keywords

EID: 77952247748     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.22.653     Document Type: Article

References (16)

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11. a) AZ Electronic Materials presentation at Nikon Lithovision Forum 2009 (San Jose, February 2009); see also corresponding Nikon eView article, in press
12. b) G. Wakamatsu et al., Proc SPIE 7273 (2009), in press.
13. c)M. Hori et al, Proc. SPIE 6923-17 (2008).
14. see ref. 4.
15. Cf. e.g., Bian, F., Liu, M. Eur. Polym. J. 39, 1867-1874 (2003).
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