Freezing material development for double patterning process

Journal of Photopolymer Science and Technology

Volumn 22, Issue 5, 2009, Pages 641-646

  Kakizawa, Tomohiro ^a   Wakamatsu, Goji ^a   Anno, Yusuke ^a   Hori, Masafumi ^a   Mita, Michihiro ^a   Hoshiko, Kenji ^a   Shioya, Takeo ^a   Fujiwara, Koichi ^a   Kusumoto, Shiro ^a   Yamaguchi, Yoshikazu ^a   Shimokawa, Tsutomu ^a  

^a JSR CORPORATION   (Japan)

Author keywords

Double patterning; Freezing; Lithography; Self freezing resist

Indexed keywords

EID: 77952047753     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.22.641     Document Type: Article

References (7)

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