Negative tone 193 nm resists

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3999, Issue , 2000, Pages

  Cho, Sungseo ^a   Heyden, Anthony Vander ^a   Byers, Jeffrey ^a   Willson, C Grant ^a  

^a UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACRYLIC MONOMERS; DISSOLUTION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; LIGHT MODULATION; LIGHT POLARIZATION; SYNTHESIS (CHEMICAL);

CHEMICALLY AMPLIFIED RESISTS; NORBORNENES;

PHOTORESISTS;

EID: 0033706999     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (9)