Resist material for negative tone development process

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7639, Issue , 2010, Pages

  Tarutani, Shinji ^a   Kamimura, Sou ^a   Enomoto, Yuuichiro ^a   Katou, Keita ^a  

^a FUJIFILM CORPORATION   (Japan)

Author keywords

193 nm immersion lithography; Double patterning; Fine dense contact hole; Lithography performances; Negative tone imaging

Indexed keywords

193NM IMMERSION LITHOGRAPHY; CONTACT HOLES; DOUBLE PATTERNING; FINE DENSE CONTACT HOLE; NEGATIVE TONES;

PHOTOLITHOGRAPHY;

DISSOLUTION;

EID: 77953489819     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.846026     Document Type: Conference Paper

References (16)

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