Hyper-NA imaging of 45nm node random CH layouts using inverse lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Hendrickx, E ^a   Tritchkov, A ^b   Sakajiri, K ^b   Granik, Y ^b   Kempsell, M ^c   Vandenberghe, G ^a  

^a IMEC   (Belgium)

^b MENTOR GRAPHICS CORPORATION   (United States)

^c ROCHESTER INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Assist features; Contact hole imaging; Inverse lithography

Indexed keywords

(I ,J) CONDITIONS; 45NM NODE; ASSIST FEATURES; ASSIST FEATURES (AF); AUTOMATICALLY GENERATED; CONTACT HOLE (CH); DEPTH-OF-FOCUS (DOF); HYPER-NA; HYPER-NA IMAGING; ILLUMINATION CONDITIONS; IMAGE CONTRASTS; INVERSE LITHOGRAPHY TECHNIQUE (ILT); MANUFACTURABILITY; MASK WRITE TIME; MENTOR GRAPHICS (CO); MODEL BASED (OPC); OPTICAL MICRO LITHOGRAPHY; QUADRUPOLE; QUASAR ILLUMINATION; RULE-BASED;

ARCHITECTURAL DESIGN; FISH; GRAPHIC METHODS; INVERSE PROBLEMS; MATHEMATICAL MODELS; RANDOM PROCESSES; SODIUM; THEOREM PROVING;

LITHOGRAPHY;

EID: 45449088330     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.771961     Document Type: Conference Paper

References (5)

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4. Y. Granik, "Solving inverse problems of optical microlithography", Proc. SPIE 5754, 506-526 (2005)
5. P. De Bisschop et al., "Using the AIMS 45-193i for hyper-NA imaging applications", Proc. SPIE 6730, 67301G (2007)