Process feasibility investigation of freezing free process

Journal of Photopolymer Science and Technology

Volumn 22, Issue 5, 2009, Pages 647-652

  Nakamura, Tsuyoshi ^a   Takasu, Ryoichi ^a   Wong, Patrick ^b   Maendhout, Mireilli ^b  

^a TOKYO OHKA KOGYO CO LTD   (Japan)

^b IMEC   (Belgium)

Author keywords

193nm immersion; Double patterning; Freezing free; LPLE

Indexed keywords

EID: 77952087774     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.22.647     Document Type: Article

References (7)

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4. Ando T. et al., "Pattern Freezing Free Litho-Litho-Etch Double Patterning" JJAP Micro-process and Nanotechnology 2008 proceeding.
5. Ando T. et al., "Pattern Freezing Free Litho-Litho-Etch Double Patterning" Proc. SPIE, 7140 (2008)
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7. th International Symposium of Immersion Lithography Extensions (2008)