Reactive Pulsed Laser Deposition of titanium nitride thin film: Optimization of process parameters using Secondary Ion Mass Spectrometry

Applied Surface Science

Volumn 256, Issue 10, 2010, Pages 3077-3080

  Krishnan, R ^a   Mathews, Tom ^a   Balamurugan, A K ^a   Dash, S ^a   Tyagi, A K ^a   Raj, Baldev ^a   Jayaram, Vikram ^b  

^a INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

^b INDIAN INSTITUTE OF SCIENCE   (India)

Author keywords

Multilayer; Reactive Pulsed Laser Deposition; SIMS; Thin films; TiN

Indexed keywords

FILM PREPARATION; MULTILAYER FILMS; MULTILAYERS; PULSED LASER DEPOSITION; PULSED LASERS; SECONDARY EMISSION; SECONDARY ION MASS SPECTROMETRY; TIN; TITANIUM NITRIDE;

ANALYTICAL METHODOLOGY; ELEMENTAL METALS; MICROSCOPIC ANALYSIS; OPTIMIZATION OF PROCESS PARAMETERS; PROCESS PARAMETERS; REACTIVE PULSED LASER DEPOSITION; SINGLE-STEP PROCESS; TITANIUM NITRIDE THIN FILMS;

THIN FILMS;

EID: 77349089251     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.11.076     Document Type: Article

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